In organic chemistry, atoms other than carbon and hydrogen are generally referred to as heteroatoms. The most common heteroatoms are nitrogen, oxygen and sulfur. Now I present to you an article called Impact of Surface Chemistry on Copper Deposition in Mesoporous Silicon, published in 2016-08-02, which mentions a compound: 75732-01-3, mainly applied to surface chem copper deposition mesoporous silicon, Category: iodides-buliding-blocks.
An easy, efficient, and safe process is developed to metalize mesoporous Si (PSi) with Cu from the decomposition of a solution of mesitylcopper (CuMes) in an imidazolium-based ionic liquid (IL), [C1C4Im][NTf2]. The impregnation of a solution of CuMes in IL affords the deposition of metallic islands not only on the surface but also deep within the pores of a mesoporous Si layer with small pores <10 nm. Therefore, this process is well suited to efficiently and completely metalize PSi layers. An in-depth mechanistic study shows that metal deposition is due to the reduction of CuMes by surface silane groups rather than by Si oxidation as observed in aqueous or H2O-containing media. This could open a new route to the chem. metalization of PSi by less-noble metals difficult to attain by a conventional displacement reaction. Compounds in my other articles are similar to this one(Mesitylcopper(I))Category: iodides-buliding-blocks, you can compare them to see their pros and cons in some ways,such as convenient, effective and so on.
Reference:
Iodide – Wikipedia,
Iodide – an overview | ScienceDirect Topics – ScienceDirect.com